Mcpherson University, Seriki Sotayo Cut Off Mark for Radiography

McPherson University, Seriki Sotayo offers a 5-year (UTME) or 4-year (Direct Entry) programme in Radiography. The cut-off mark for this course is set annually by JAMB and the university; the general historical range for competitive courses is 190–220, but the exact figure varies each year and must be confirmed from official sources.

Quick Facts

• Duration: 5 Years (UTME) / 4 Years (Direct Entry)
• Typical UTME Subjects: English Language, Biology, Chemistry, Physics
• Typical O’Level Requirements: 5 O’Level credits including English Language, Mathematics, Biology, Chemistry and Physics
• Historical Cut-Off Range: 190 – 220 (general range across Nigerian universities, not this university’s exact current figure — always confirm with JAMB or the university’s admissions office).

Frequently Asked Questions

• How is the cut-off mark for Radiography at McPherson University determined?
  The cut-off mark is determined by the university’s admission committee based on JAMB’s yearly minimum benchmark, the number of applicants, available slots, and the candidates’ performance in UTME and post-UTME screening.
• Where can I check the official current-year cut-off mark for Radiography at McPherson University?
  The official cut-off mark is published on the JAMB website (jamb.gov.ng) and on McPherson University’s admissions portal. You can also visit the university’s notice board or contact their admissions office directly.
• What happens if I score below the Radiography cut-off mark at McPherson University?
  If your score is below the cut-off, you may not be offered admission into Radiography. You can consider changing your course to a less competitive programme at the same university or apply to another institution through JAMB’s change of institution process.

Make sure to verify the exact current-year cut-off mark for Radiography at McPherson University from the official JAMB portal or the university’s website. Stay updated with admission announcements and meet all O’Level requirements to strengthen your application.