Federal University of Technology, Owerri Cut Off Mark for International Relations

This page provides information about the cut off mark for the International Relations programme at the Federal University of Technology, Owerri (FUTO). The exact current-year cut off mark is determined by the university and JAMB. Historically, cut off marks for similar programmes in Nigerian universities have ranged between 190 and 230, but candidates should always verify the official figure from the university.

Quick Facts

• Duration: 4 Years (UTME) / 3 Years (Direct Entry)
• Typical UTME Subjects: English Language, Government, History or Economics, one other relevant subject
• Typical O’Level Requirements: 5 O’Level credits including English Language and four relevant Arts/Social Science subjects
• Historical Cut-Off Range: 190 – 230 (general range across Nigerian universities, not this university’s exact current figure — always confirm with JAMB or the university’s admissions office).

Frequently Asked Questions

• How is the cut off mark for International Relations at FUTO determined?
  The cut off mark is set by FUTO in consultation with JAMB, based on factors such as the number of applicants, their UTME performance, and the available capacity for the programme.
• Where can I find the official current-year cut off mark for International Relations at FUTO?
  Check the FUTO admissions portal (futo.edu.ng) and the JAMB official website for the latest admission guidelines and cut off mark for the current academic year.
• What should I do if my UTME score is below the cut off mark for International Relations at FUTO?
  You may consider applying for a change of institution or course through JAMB, or explore other programmes at FUTO with lower cut off marks. Contact the FUTO admissions office for guidance.

To obtain the exact cut off mark for International Relations at FUTO for the current admission year, always refer to the official JAMB brochure and the FUTO admissions portal. These are the only authoritative sources for accurate information. Best of luck with your application.